Indian Institute of Technology Hyderabad (IITH) is a premier institute of science and technology established in 2008. IITH has been consistently ranked in the&nbsp;<a href="https://iith.ac.in/reports/" rel="noopener noreferrer">top 10 institutes</a>&nbsp;in India for Engineering&nbsp;<a href="https://www.nirfindia.org/2021/EngineeringRanking.html" rel="noopener noreferrer" target="_blank">according to NIRF</a>&nbsp;making it one of the most coveted schools for science and technology in the country.

IITH offers&nbsp;<a href="https://iith.ac.in/academics/under-graduate/">undergraduate programs</a>&nbsp;in all the classical engineering disciplines, applied sciences, design, as well as several modern interdisciplinary areas. Students are given a flexibility to explore a broad set of areas, and potentially pursue a minor or double major in a discipline that is not their own. Students who wish to seek a deeper understanding of their own discipline are strongly encouraged to get involved in cutting-edge research with the help of a faculty to mentor them, and earn an Honors in their own field.

The very foundation of IIT Hyderabad is based on&nbsp;<a href="https://iith.ac.in/research/">research and innovation</a>. The vibrant research culture is evident from the number of patents and publications that IITH produces consistently every year. IITH offers&nbsp;<a href="https://iith.ac.in/academics/programmes-offered/">graduate programs</a>&nbsp;at both a masters, and a doctoral level, in several diverse areas. There are separate programs for technology, design, science, and liberal arts. The&nbsp;<a href="https://iith.ac.in/academics/post-graduate/">MTech program</a>&nbsp;is offered in various modes and durations to cater to the ever-growing need of postgraduate level professionals in the country.

IITH encourages and supports&nbsp;<a href="https://iic-iith.netlify.app/index.html" rel="noopener noreferrer" target="_blank">innovation and entrepreneurship</a>&nbsp;at every stage. The minor program in entrepreneurship is open to all students of IITH, and many of the courses are offered by industrialists who are entrepreneurs themselves. There are various&nbsp;<a href="https://iith.ac.in/research/centres-incubators/">innovation centers and incubators</a>&nbsp;that promote entrepreneurship and help mentor young innovators. IITH has been very successful in building tie-ups with leading academic institutions around the globe.

IITH enjoys a very special relationship with Japanese universities and industries that goes beyond academic and research collaborations. In fact, some of the iconic buildings in IITH campus will carry the signature of Japanese architecture.

IITH creates a unique holistic ecosystem for education that offers interactive learning, a very flexible academic structure, cutting-edge research, strong industry collaboration, and entrepreneurship. This is an environment which enables students and faculty to translate their dreams into realities.

IIT Hyderabad

Microcolumns are widely used for parallel electron-beam lithography because of their compactness and the ability to achieve high spatial resolution. A design of an electrostatic microcolumn for our recent nanoscale photoemission sources is presented. We proposed a compact column structure (as short as several microns in length) for the ease of microcolumn fabrication and lithography operation. We numerically studied the influence of several design parameters on the optical performance such as microcolumn diameter, electrode thickness, beam current, working voltages, and working distance. We also examined the effect of fringing field between adjacent microcolumns during parallel lithography operations. The microcolumns were also fabricated to show the possibility. © 2016 COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only.

World University root node

Department of Mechanical and Aerospace Engineering

Proceedings of SPIE - The International Society for Optical Engineering

Design and fabrication of electrostatic microcolumn in multiple electron-beam lithography

Controlled fabrication of single and multiple nanostructures far below the diffraction limit using a method based on laser induced periodic surface structure (LIPSS) is presented. In typical LIPSS, multiple lines with a certain spatial periodicity, but often not well-aligned, were produced. In this work, well-controlled and aligned nanowires and nanogrooves with widths as small as 40 nm and 60 nm with desired orientation and length are fabricated. Moreover, single nanowire and nanogroove were fabricated based on the same mechanism for forming multiple, periodic structures. Combining numerical modeling and AFM/SEM analyses, it was found these nanostructures were formed through the interference between the incident laser radiation and the surface plasmons, the mechanism for forming LIPSS on a dielectric surface using a high power femtosecond laser. We expect that our method, in particular, the fabrication of single nanowires and nanogrooves could be a promising alternative for fabrication of nanoscale devices due to its simplicity, flexibility, and versatility.

Scientific Reports

Sub-diffraction limited writing based on laser induced periodic surface structures (LIPSS)

Optical lithography, the enabling process for defining features, has been widely used in semiconductor industry and many other nanotechnology applications. Advances of nanotechnology require developments of high-throughput optical lithography capabilities to overcome the optical diffraction limit and meet the ever-decreasing device dimensions. We report our recent experimental advancements to scale up diffraction unlimited optical lithography in a massive scale using the near field nanolithography capabilities of bowtie apertures. A record number of near-field optical elements, an array of 1,024 bowtie antenna apertures, are simultaneously employed to generate a large number of patterns by carefully controlling their working distances over the entire array using an optical gap metrology system. Our experimental results reiterated the ability of using massively-parallel near-field devices to achieve high-throughput optical nanolithography, which can be promising for many important nanotechnology applications such as computation, data storage, communication, and energy.

Fulltext

High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field

Tool condition monitoring by machine vision approach has been gaining popularity day by day since it is a low cost and flexible method. In this paper, a tool condition monitoring technique by analysing turned surface images has been presented. The aim of this work is to apply an image texture analysis technique on turned surface images for quantitative assessment of cutting tool flank wear, progressively. A novel method by the concept of Voronoi tessellation has been applied in this study to analyse the surface texture of machined surface after the creation of Voronoi diagram. Two texture features, namely, number of polygons with zero cross moment and total void area of Voronoi diagram of machined surface images have been extracted. A correlation study between measured flank wear and extracted texture features has been done for depicting the tool flank wear. It has been found that number of polygons with zero cross moment has better linear relationship with tool flank wear than that of total void area. © 2013 Elsevier B.V. All rights reserved.

Journal of Materials Processing Technology

Progressive cutting tool wear detection from machined surface images using Voronoi tessellation method

With the advancement of digital image processing, tool condition monitoring using machine vision is gaining importance day by day. In this work, online acquisition of machined surface images has been done time to time and then those captured images were analysed using an improvised grey level co-occurrence matrix (GLCM) technique with appropriate pixel pair spacing (pps) or offset parameter. A novel technique has been used for choosing the appropriate pps for periodic texture images using power spectral density. Also the variation of texture descriptors, namely, contrast and homogeneity, obtained from GLCM of turned surface images have been studied with the variation of machining time along with surface roughness and tool wear at two different feed rates. © 2012 Elsevier Inc. All rights reserved.

Precision Engineering

Detection of tool condition from the turned surface images using an accurate grey level co-occurrence technique

The main purpose of this work was to study the applicability of an image texture analysis method, namely, the grey level co-occurrence matrix (GLCM) method for the examination of the smoothness of the images of a turned surface. The effect of the variation of the pixel pair spacing (pps) on the construction of the GLCM was also considered and then, contrast and homogeneity were calculated from the GLCMs which served as texture descriptors for the quality of the machined surface. Finally, the variation of these texture descriptors with cutting time was analyzed and compared with the variation of tool wear and surface roughness with cutting time.