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Influence of after-growth thermal treatments on crystal defects revealed by daylight induced coloration and afterglow in CsI: Tl scintillators
, M. Tyagi, D.G. Desai, A.K. Chauhan, S.C. Gadkari
Published in
2010
Volume: 1313
   
Pages: 337 - 339
Abstract
Effects of growth process and after growth thermal treatment on daylight coloration and afterglow of CsI:Tl scintillator have been studied. Induced absorption, photoluminescence, thermo-luminescence and afterglow were used as tools for the identification/analysis of crystal defects. Formation of color centers and their dependence on growth process were established. A possible diffusion mechanism of color centers during the heat treatment of the crystal is proposed. Results of our experiments show that a post growth annealing minimize those number of color centers that are directly responsible for afterglow and daylight coloration. It has been demonstrated that excess of centers associated with Tl+ dimers are also responsible for the large afterglow in this crystal. © 2010 American Institute of Physics.
About the journal
JournalAIP Conference Proceedings
ISSN0094243X