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Facile non thermal plasma based desorption of self assembled monolayers for achieving low temperature and low pressure Cu-Cu thermo-compression bonding
Published in Royal Society of Chemistry
2015
Volume: 5
   
Issue: 125
Pages: 103643 - 103648
Abstract
This paper reports Self Assembled Monolayer (SAM) of propanethiol desorption assisted low temperature, low pressure copper to copper (Cu-Cu) thermo-compression bonding, a technique which could potentially open up a whole new platform for developing next generation heterogeneous smart devices using 3D integrated circuit technology. Thiolated self assembled monolayers protect a freshly deposited copper surface from oxidation and other contamination. Removal of this SAM layer just prior to bonding would potentially bring down temperature and pressure thus rendering the process CMOS compatible. This paper focuses on using Non-Thermal Plasma (NTP) desorption, which is a simple, robust, room temperature technique for desorbing SAMs. The desorption was carried out in an indigenous chamber specifically designed for this purpose. Thermo-compression bonding post desorption resulted in a very good quality bonding with a bond strength of 132 MPa, performed at a relatively low temperature of 200 °C and a low pressure of 5 bar. © The Royal Society of Chemistry.
About the journal
JournalData powered by TypesetRSC Advances
PublisherData powered by TypesetRoyal Society of Chemistry
ISSN20462069
Authors (4)