A strategy for the synthesis of well defined poly(ethylene glycol)-block-poly(methyl methacrylate) diblock copolymers containing trityl ether acid cleavable junctions is demonstrated. This approach is achieved by using a combination of poly(ethylene glycol) macroinitiator containing a trityl ether end group, which is susceptible to acid cleavage, and atom transfer radical polymerization technique. The trityl ether linkage between blocks can be readily cleaved in solution or in solid phase under very mild acid condition, which has been confirmed by 1H NMR. These diblock copolymers have been used to successfully fabricate nanoporous thin films by acid cleavage of trityl ether junction followed by complete removal of poly(ethylene glycol) block. The fabricated nanoporous thin films may have a wide range of application such as Recessed Nanodisk-array electrode (RNE) or as a template to fabricate nanoelectrode array for senor applications. © 2020 Qi et al., published by De Gruyter 2020.