Header menu link for other important links
X
Plasmon-induced Charge Transport at Transition Metal Nitride-Semiconductor Interfaces via in Situ Nanoimaging
M.-W. Yu, S. Ishii, , N. Kevin Tanjaya, K.-P. Chen, T. Nagao
Published in Institute of Electrical and Electronics Engineers Inc.
2021
Abstract
Photoexcited Kelvin probe force microscope is used to image hot carriers excited in transition metal nitride-semiconductor heterostructures. Both hot holes are hot electron injections are revealed depending on the carrier types of the semiconductors. © 2021 OSA.
About the journal
JournalData powered by Typeset2021 Conference on Lasers and Electro-Optics, CLEO 2021 - Proceedings
PublisherData powered by TypesetInstitute of Electrical and Electronics Engineers Inc.
ISSN21622701
Open AccessNo