Uniform and transparent thin films of Zn1-xMnxO (0≤x≤0.10) were fabricated by a sol-gel spin coating method. XRD results indicated the hexagonal structure of ZnO as the primary phase at all concentrations (x) of Mn. However, at x≥0.035, Mn3O4 (tetragonal) is observed as the secondary phase, which was confirmed by selected-area electron diffraction patterns. SEM and TEM results showed a tendency of grains to arrange into wire-shaped morphologies, leading to elongated needle-like structures at high Mn addition. Increasing Mn content in the range 0≤x≤0.10 led to quenching of photoluminescence, increase in the band gap (Eg) from 3.27 to 3.33 eV, and increase in film thickness, refractive index and extinction coefficient of Zn1-xMnxO thin films. The residual stress evaluated was compressive in all cases and found to increase by an order of magnitude with addition of Mn. Furthermore, an overall increase in microhardness and yield strength of Zn1-xMnxO thin films at higher Mn concentrations is attributed to change in microstructures, presence of secondary phase and increase in film thickness. © 2008 Elsevier Ltd. All rights reserved.