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Optical-phonon-limited high-field transport in layered materials
H. Chandrasekar, K.L. Ganapathi, , N. Bhat, D.N. Nath
Published in Institute of Electrical and Electronics Engineers Inc.
2016
Volume: 63
   
Issue: 2
Pages: 767 - 772
Abstract
An optical-phonon-limited velocity model has been employed to investigate high-field transport in a selection of layered 2-D materials for both, low-power logic switches with scaled supply voltages, and high-power, high-frequency transistors. Drain currents, effective electron velocities, and intrinsic cutoff frequencies as a function of carrier density have been predicted, thus providing a benchmark for the optical-phononlimited high-field performance limits of these materials. The optical-phonon-limited carrier velocities for a selection of multilayers of transition metal dichalcogenides and black phosphorus are found to be modest compared to their n-channel silicon counterparts, questioning the utility of biasing these devices in the source-injection dominated regime. h-BN, at the other end of the spectrum, is shown to be a very promising material for high-frequency, high-power devices, subject to the experimental realization of high carrier densities, primarily due to its large optical-phonon energy. Experimentally extracted saturation velocities from few-layer MoS2 devices show reasonable qualitative and quantitative agreement with the predicted values. The temperature dependence of the measured vsat is discussed and compared with the theoretically predicted dependence over a range of temperatures. © 2015 IEEE.
About the journal
JournalData powered by TypesetIEEE Transactions on Electron Devices
PublisherData powered by TypesetInstitute of Electrical and Electronics Engineers Inc.
ISSN00189383