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CVD growth and processing of graphene for electronic applications
, N. McEvoy, H.-Y. Kim, K. Lee, N. Peltekis, E. Rezvani, H. Nolan, A. Weidlich, R. Daly, G.S. Duesberg
Published in Wiley-VCH Verlag
2011
Volume: 248
   
Issue: 11
Pages: 2604 - 2608
Abstract
The remarkable properties of graphene have potential for numerous applications; however, their exploitation depends on its reliable production. The chemical vapour deposition (CVD) growth of graphene on metal surfaces has become one of the most promising strategies for the production of high quality graphene in a scaleable manner. Here, we discuss graphene growth on nickel (Ni) and copper (Cu) directly from both gaseous hydrocarbons and solid carbon precursors. Further, we discuss in detail the transfer of graphene films to insulating substrates, by direct and polymer supported transfer methods. © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
About the journal
JournalData powered by TypesetPhysica Status Solidi (B) Basic Research
PublisherData powered by TypesetWiley-VCH Verlag
ISSN03701972