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A unified kinetic model for stress relaxation and recovery during and after growth interruptions in polycrystalline thin films
Published in Acta Materialia Inc
2020
Volume: 193
   
Pages: 202 - 209
Abstract
A model for the kinetics of residual stress evolution is described that can be applied to both the relaxation during a growth interruption and the recovery following resumption of growth. The stress is attributed to simple atomistic processes based on reversible diffusion of atoms in and out of the grain boundary. Each of these processes is considered separately to understand how the rates differ during relaxation and recovery and how they depend on grain size, film thickness, temperature, deposition rate, and initial stress. The model is compared with experimental data obtained by others for several materials (Fe, Ni and Au). © 2020 Acta Materialia Inc.
About the journal
JournalActa Materialia
PublisherActa Materialia Inc
ISSN13596454